Automation and efficiency improvement of the pretreatment process in the decomposition (melting) of metallic silicon.
Sample pretreatment for ICP and ICP/MS in the decomposition (melting) of hydrofluoric acid and highly reactive metal silicon!
Silica (SiO2 and its compounds) involves complicated reagent addition operations in acid decomposition, making it very labor-intensive. Additionally, there are issues related to human exposure to acidic reagents such as hydrofluoric acid, which poses risks during analysis. Therefore, using the automated pretreatment device DEENA2 for acid addition and other processes, we automated the sample pretreatment for ICP and ICP/MS. 【Summary (Partial)】 ■ Established a method for fully automated analysis, from the automatic addition of nitric acid and hydrofluoric acid to stirring and up to dilution. ■ Successfully analyzed reactive metallic silicon with hydrofluoric acid while controlling the reaction safely. ■ Reduced human exposure to hydrofluoric acid and nitric acid to nearly zero. ■ Completely automated pretreatment tasks that previously required human intervention. ■ Conducted decomposition within a clean bench by using a fume hood. *For more details, please download the PDF or feel free to contact us.
- Company：ビーエルテック
- Price：Other
